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Metal chalcogenide thin films: Deposition and characterization 

by Dr. Ho Soon Min, Dr. Barun Ghosh, Dr. Chandra Shekhar Prajapati and Dr. Minnam Reddy Vasudeva Reddy







Metal chalcogenide thin films: Deposition and characterization



300 INR/ 10 USD 






Dr. Ho Soon Min, Dr. Barun Ghosh, Dr. Chandra Shekhar Prajapati

and Dr. Minnam Reddy Vasudeva Reddy



Text Book




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Language : English






Raman spectroscopy study of thin films: a review 


Preparation of thin films using chemical vapour deposition method


Deposition of thin films using spray pyrolysis method


Metal chalcogenide thin films: chemical bath deposition


A review on metal oxide-based thin films


Authors Information:

Dr. Ho Soon Min is an associate professor in Faculty of Information Technology-Math & Science at INTI International University, Malaysia. His research areas include environmental chemistry, activated carbon, green chemistry, semiconductor, nano materials and thin film solar cells.

Dr. Barun Ghosh is an Experimental Physicist working in a diverse area of Science and Nanotechnology at University of South Africa. His main research focuses are on thin film solar cell, silicon solar cell, plasmonic effect in photovoltaics, graphene-based 2D materials.

Dr. Chandra Shekhar Prajapati is lecturer at DST-Inspire Faculty at CeNSE, IISc Bangalore, India. His areas of interest are mainly chemical gas sensors for air quality monitoring and breathe analyzer, optoelectronics and photonics. 

Dr. Vasudeva Reddy Minnam Reddy is an International Research Professor in School of Chemical Engineering, Yeungnam University. His research interest is fabrication of earth-abundant solar cells and TCO layers.

Salient Features:


Metal chalcogenide thin films with thickness ranging from nanometer to several micrometers were synthesized using various deposition methods such as chemical bath deposition method, spray pyrolysis and chemical vapor deposition. The term chalcogen includes all the elements of the group sixteen in the periodic table and the compounds that contain minimum one chalcogens are termed as chalcogenides. However, in view of technological importance, the term chalcogenide is frequently associated with the compounds containing considerable quantities of sulfur, selenium, tellurium. Nanostructured thin films are attracting considerable attention due to have wide applications in solar cells, sensor devices, optoelectronic device, photoconductor, optical imaging, optical mass memories, hologram recording and solar selective coatings. These semiconductor materials possess increased structural integrity as well as unique optical, chemical, and electrical properties. The unique function of these nanomaterials directly depends on their size, morphology, composition and structure dependent properties.



In this book, we have focused on the preparation and characterization of thin films. Definitely this book is different in all aspects starting from contents, as this book gives detailed information about the thin films which includes mainly:-

  • Chemical bath deposition method has been emerged as a method for the deposition of metal chalcogenide thin films at low cost owing to short reaction time, low energy consumption, and extremely simple set up. It allows the deposition of thin films at relatively low temperatures.

  • Spray pyrolysis is a chemical deposition technique. It is a simple and economic method having high growth rate, mass production capability and suitable for incorporating foreign impurities. It involves low cost equipment and raw materials.

  • As the applications and usage of nano sized particles are increasing enormously in day to day technology, this book will explore the newer aspects of nano particles.

  • Chemical vapour deposition has become the lead thin film deposition methods for the semiconductor industry due to its high throughput, high purity, and low cost operation.

  • Raman spectroscopy is one of the most powerful tools for determining the crystalline structure and quality of semiconductor thin films (binary, ternary, quaternary and pen ternary). It provides a fingerprint by which the molecule can be identified. In this work, advantage and limitation of Raman technique were discussed.

  • Metal oxide based thin films have gained enormous attention and are currently being widely used in modern technology. These semiconductor materials are used in variety applications in microelectronic, optical application, gas sensing application, energy storage application, photocatalyst, photoconductive, electrochromic, supercapacitor, protection layer and magnetic head recording. Therefore, in the present book, preparation of metal oxide films using several deposition methods will be discussed.